منابع مشابه
A plasma discharge model of a microwave plasma diamond CVD reactor
A self-consistent electromagnetic eld model and a uid plasma model have been developed for a microwave plasma reactor used for diamond chemical vapor deposition. The coupled numerical models simulate the electromagnetic excitation of the hydrogen discharge and the hydrogen plasma discharge characteristics. The time-varying electric and magnetic elds inside the reactor, both inside and outside t...
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LPCVD is a process used in the manufacturing of the deposition of thin films on semiconductors usually ranging from a few nanometers to many micrometers. LPCVD is used to deposit a wide range of possible film compositions with good conformal step coverage. These films include a variety of materials including polysilicon for gate contacts, thick oxides used for isolation, doped oxides for global...
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Hydrocarbon precursor such as methane has been widely used to grow graphene films and the methods of growing quality graphene films are dominated by thermal CVD (chemical vapor deposition) system. Graphene films grown by plasma process are generally highly defective which in turns degrade the quality of the films. Here, using a green precursor, camphor we demonstrate a simple and economical met...
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ژورنال
عنوان ژورنال: Journal of the Surface Finishing Society of Japan
سال: 1994
ISSN: 0915-1869,1884-3409
DOI: 10.4139/sfj.45.1126